Hydrogen Desorption Kinetics Derived from Electrochemical Ni-B Compositions

Abstract

The paper studies how boron concentration exerts its influence on the structure of nickel-boron-hydrogen composites. An increase in the concentration of the alloying component of boron in nickel increases the dispersion and leads to the alignment of the micro-profile surface and the formation of the nano-sized structures. Boron is an impurity trap for hydrogen atoms in Ni–B electrochemical composites. The paper also presents the results of the studies of the kinetics of hydrogen desorption from Ni-B electrochemical composites. The hydrogen content in the Nix-By-Hz samples (9 at.% Boron), measured by the vacuum extraction method, was 600 cm3/100 g, which significantly exceeds the corresponding value for electrochemical nickel ~ 100 cm3 per 100 g. In this respect, deuterium thermal desorption spectrums from Ni–B composites preimplanted with various doses of deuterium ions at T ~ 100 K were studied. It has been confirmed that the structure of the deuterium thermal desorption spectrum is the implantation dose function. The deuterium content for nickel corresponds to the following ratio: Ni: D = 1:1, whereas the ratio for the composite is Ni95B5 [Ni95:B5]:D = 1:1.25. Distinct peak with a maximum temperature of 325 K is formed for the nickel. Whereas for the Ni–B composite, the thermal desorption spectrum has a diffuse peak with a maximum temperature of 325 K and a deuterium desorption region where the temperature ranges from 250 to 500 K.